0:06
At a seminar held at the Institute of
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Semiconductor Physics of the Siberian
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branch of the Russian Academy of
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Sciences in Novo Subursk, candidate of
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physical and mathematical sciences,
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Dimmitri Sheg discussed the potential
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development of X-ray lithography
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technology in Russia through the use of
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the new skiff facility which is
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currently undergoing commissioning in
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According to him, Skype could play a
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crucial role in creating a fundamentally
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new platform for microlithography based
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on the X-ray spectrum, thereby helping
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to overcome existing technological
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limitations in electronics.
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The skiff experiment is only one element
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within a broader scientific landscape.
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It represents mega science level
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infrastructure forming a cuttingedge
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foundation for research in physics,
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material science, biology and other
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The facility has entered the
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commissioning phase near Nova Suburk
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with initial scientific experiments
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scheduled to begin in 2025.
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The Siberian circular photon source
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known as KE is an advanced fourth
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generation synretron radiation facility
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with an electron energy of 3 giga
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electron volts. It is being constructed
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in the nova suburk region as a major
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national scientific installation
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combining accelerator systems with
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experimental stations that allow
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researchers to work with highly
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brilliant intense and coherent x-ray
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A defining scientific characteristic of
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skiff is its ultra low emittance, a
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parameter describing the purity and
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focusability of the electron beam. Low
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emittance enables extremely high
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brightness, strong coherence, and a
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narrow angular spread of radiation.
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These properties are essential for the
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most demanding experiments in both
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fundamental and applied science.
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The facility is being developed within
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Russia's national project titled science
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and universities with the participation
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of the Budker Institute of Nuclear
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Physics of the Siberian branch of the
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Russian Academy of Sciences and other
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research organizations.
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The complex will include multiple
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experimental beam lines, engineering
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systems, laboratories, and support
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infrastructure dedicated to solving
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problems ranging from material science
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and chemistry to biology and
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Synretron radiation is electromagnetic
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emission produced when charged
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particles, primarily electrons, are
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accelerated within magnetic fields. This
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radiation possesses unique qualities
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including extremely high brightness, a
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broad spectral range extending from
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infrared to hard X-rays, strong
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directionality and coherence, and
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precise spectral tunability.
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These characteristics make synretron
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radiation an indispensable tool for
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atomic scale structural analysis.
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It enables research spanning from
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biomolelecular crystalallography to the
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study of ultraast phenomena in advanced
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Today more than 50 synretron radiation
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facilities operate worldwide as major
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national and international research
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centers. These include ERF in France,
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MAX 4 in Sweden, Diamond Light Source in
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the United Kingdom and NSLS2 in the
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United States. Together they provide
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millions of research hours to scientists
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working in material science, energy,
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chemistry, biology, and medicine.
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Lithography is the foundational
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technology used to fabricate circuit
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patterns on semiconductor substrates.
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It defines the geometry and dimensions
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of micro electronic components directly
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influencing performance, energy
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efficiency, and functional capability of
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modern electronic devices.
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The prevailing global standard in
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semiconductor manufacturing relies on
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extreme ultraviolet lithography which
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operates at a wavelength of
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approximately 13.5 nanome.
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This technology supports the production
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of advanced chips at companies such as
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TSMC, Samsung, and Intel. Further
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miniaturization, however, requires even
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shorter wavelengths, making X-ray
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lithography a potential next step.
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So far, large-scale industrial adoption
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of X-ray lithography has been limited by
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substantial technical challenges.
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These include the need for ultrarecise
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radiation sources, advanced optical
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systems, highly accurate photo masks,
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X-ray sensitive resists, specialized
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instrumentation, and extremely stable
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vacuum environments. If these barriers
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are overcome, X-ray lithography could
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enable dramatic feature scaling and
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entirely new semiconductor
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According to Dimmitri Shegll and other
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Russian researchers, SKF's unique
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properties make it a promising platform
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for X-ray lithography experiments.
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As a bright and highly coherent X-ray
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source, skiff can be adapted for complex
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studies involving the formation of micro
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and nanoructures using X-ray radiation.
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This approach represents a direct link
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between fundamental science and applied
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Using a synretron source, scientists can
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test new photomask materials, study
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exposure regimes, analyze interactions
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between X-rays and resists, and develop
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experimental techniques that could later
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form the basis of industrial X-ray
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As a result, she emphasized researchers
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are gaining an exceptionally powerful
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tool. He urged active participation and
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stressed the importance of securing beam
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lines in the next construction phase for
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semiconductor and solid state physics
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At present, no large-scale commercial
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semiconductor factories use synretron
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radiation directly for mass production
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The global industry continues to rely
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primarily on extreme ultraviolet
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scanners produced by ASML.
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Nevertheless, research into X-ray
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lithography is ongoing.
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For example, a United States startup
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named Substrate has introduced an X-ray
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lithography system based on particle
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accelerators that could potentially
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achieve critical dimensions of around 2
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This positions it as a possible
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alternative or complement to extreme
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ultraviolet technology.
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In addition, many synretron facilities
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worldwide already use X-ray beams for
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deep X-ray lithography, also known as
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Facilities such as Anka in Germany have
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demonstrated the effectiveness of
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synretronbased X-ray lithography for
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producing extremely precise
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microructures even though it is not yet
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used for mainstream semiconductor
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There is also growing interest in X-ray
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free electron lasers which generate
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ultrashort and highly intense X-ray
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These sources may become critical for
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future lithography methods and for
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studying ultraast structural changes in
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For SKF to function as a practical
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platform for advancing X-ray
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lithography, several major challenges
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must be addressed. These include the
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development of advanced X-ray optics for
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beam shaping and focusing, creation of
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stable and sensitive X-ray resists,
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improvements to synchronization and
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control systems, and achieving long-term
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stability suitable for industrial use.
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Many of these issues remain research
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topics rather than fully engineered
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However, the existence of a powerful
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domestic synretron facility provides the
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conditions necessary for systematic
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experimentation and for attracting
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collaborative research efforts.
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The skiff project in Akadam Gordoc
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represents far more than a new
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scientific installation.
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It forms a cornerstone for a new phase
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of technological development in Russia.
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By combining fundamental research with
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applied potential, skiff opens
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opportunities in X-ray lithography, a
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key technology for the future of micro
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If Russia successfully leverages SCF's
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capabilities and builds a strong
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ecosystem of scientists, engineers, and
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technologists around it, the facility
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could provide a significant competitive
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advantage on the global stage. It would
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support progress in material science and
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highresolution structural analysis and
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may ultimately enable breakthroughs in
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semiconductor manufacturing.
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At a time when micro electronics
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development is increasingly constrained
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by the physical limits of existing
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lithographic methods, infrastructure
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projects like SCF may serve as catalysts
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for redefining how future microchips are
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designed and produced from foundational
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experiments to transformative industrial
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